发明名称 Bipolar transistor having self-aligned silicide and a self-aligned emitter contact border
摘要 The present invention provides a bipolar transistor having a raised extrinsic base silicide and an emitter contact border that are self-aligned. The bipolar transistor of the present invention exhibit reduced parasitics as compared with bipolar transistors that do not include a self-aligned silicide and a self-aligned emitter contact border. The present invention also is related to methods of fabricating the inventive bipolar transistor structure. In the methods of the present invention, a block emitter polysilicon region replaces a conventional T-shaped emitter polysilicon.
申请公布号 US2005242373(A1) 申请公布日期 2005.11.03
申请号 US20050175094 申请日期 2005.07.05
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 AHLGREN DAVID C.;FREEMAN GREGORY G.;KHATER MARWAN H.;VOLANT RICHARD P.
分类号 H01L21/28;H01L21/331;H01L21/8249;H01L29/08;H01L29/417;H01L29/423;H01L29/732;H01L29/737;(IPC1-7):H01L31/072 主分类号 H01L21/28
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