| 摘要 |
An exposing mask capable of obtaining a sufficient gradient with a simple structure and forming a 3-D shape by exposing. An exposing mask (M) used in an exposure system (S), wherein a plurality of pattern blocks, each comprising a pair of a light shielding pattern for shielding light emitted from the exposure system (S) and a transmission pattern for transmitting this light, are continuously arranged, and they are provided at a constant pitch with a ratio between a light shielding pattern and a transmission pattern gradually varying. |
