| 发明名称 |
POLISHING CLOTH AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing cloth which can perform stable polishing performance for a long time without performing a dressing process. <P>SOLUTION: The polishing cloth used to polish a chemical mechanical polish includes a molding product made of a (meth)acrylic copolymer having an acid value of 10-100 mgKOH/g and a hydroxyl group value of 50-150 mgKOH/g. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
| 申请公布号 |
JP2005166766(A) |
申请公布日期 |
2005.06.23 |
| 申请号 |
JP20030400915 |
申请日期 |
2003.11.28 |
| 申请人 |
TOSHIBA CORP;NOF CORP |
发明人 |
HIRABAYASHI HIDEAKI;SAKURAI NAOAKI;SAITO AKIKO;SATO HIROSHI;YAMADA TOMIO |
| 分类号 |
B24B37/20;B24B37/24;B24B53/00;B24D3/28;B24D13/14;C08F220/06;C08F220/26;C08L33/00;C09G1/00;H01L21/304 |
主分类号 |
B24B37/20 |
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