发明名称 Device for controlling saturation of gas filter comprises placing secondary filter in parallel with primary filter so it is representative of primary filter and responds to immediate control
摘要 <p>A primary filter (1) is placed in a primary filtration circuit (C1). A secondary filter (5) is placed in a bypass in a secondary circuit (C2) so the secondary filter is representative of the state of the primary filter and responds to immediate control. Tracer gases are injected (by 3) upstream of the secondary filter and detected downstream, with the detector (6) activating an alarm (7). The injector of tracer gases is fed from a reservoir (4) of tracer gases. A primary ventilator (2) and a secondary ventilator (8) are placed respectively upstream or downstream of the principal and secondary filters. The secondary filter is smaller than the primary filter and is identical to the primary filter with respect to the filtered product, contact time, speed of passage and geometry. The tracer gases injected upstream of the secondary filter are representative of the filtered gases.</p>
申请公布号 FR2861319(A1) 申请公布日期 2005.04.29
申请号 FR20030012438 申请日期 2003.10.24
申请人 GIAT INDUSTRIES 发明人 RECH MARC
分类号 B01D53/04;B01D53/30;(IPC1-7):B01D53/30;A62B27/00 主分类号 B01D53/04
代理机构 代理人
主权项
地址