发明名称 SYSTEM AND METHOD FOR MANAGING WATER SUPPLY FACILITY
摘要 <p><P>PROBLEM TO BE SOLVED: To rationalize the management of water supply facilities and to secure the traceability of city water when the city water is supplied or distributed on the basis of an estimation of a concentration distribution. <P>SOLUTION: This system for managing water supply facilities has: a residual chlorine automatic measuring unit for measuring residual chlorine in the water of a water purifying facility after a chlorinating agent is injected, the residual chlorine in the water of a water distributing facility and the residual chlorine in the water of at least one hydrant; a process data measuring unit for measuring process data in a sterilization process for injecting the chlorinating agent and the water distributing facility; a process data storage means for storing the process data; a diagnosis means for judging according to a diagnosis rule whether or not each of the residual chlorine values measured by the residual chlorine automatic measuring unit is within the stipulated value preset according to each item of safety hazards and; a residual chlorine distribution storage means for storing a measured spot, a measured value and a date when the measured residual chlorine value is deviated from the stipulated value. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2005095735(A) 申请公布日期 2005.04.14
申请号 JP20030330897 申请日期 2003.09.24
申请人 HITACHI LTD 发明人 YOKOI HIROTO;ENBUTSU ICHIRO;KAGEYAMA KOJI;HARA NAOKI;YODA MIKIO
分类号 C02F1/00;C02F1/50;G06Q50/00;G06Q50/06;(IPC1-7):C02F1/00;G06F17/60 主分类号 C02F1/00
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