| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin which has dissolution contrast sufficient for practical uses, when used in resists, and can prevent the deformation of a pattern. <P>SOLUTION: This resin which is used for resists and whose solubility in an alkali is increased by the action of an acid is characterized by comprising a star type branched polymer in which polymer chains are extended from a lower alkyl molecule in three or more directions. The resin which is used for resists and whose solubility in an alkali is increased by the action of an acid is characterized by comprising a star type branched polymer obtained by the polymerization of a (meth)acrylate monomer-containing monomer in the presence of a tri- or more-functional chain transfer agent. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
