发明名称 Method of fabrication of a bipolar transistor
摘要 <p>A bipolar transistor (10) includes a collector region (13), a base region (14) in the collector region (13), and an emitter region (20) in the base region (14). A portion (18) of an electrical conductor (16) is located over a base width (23) of the bipolar transistor (10). The emitter region (20) is self-aligned to the portion (18) of the electrical conductor (16) and is preferably diffused into the base region (14) in order to decrease the base width (23) without relying on extremely precise alignment between base region (14) and the portion (18) of the electrical conductor (16). The portion (18) of the electrical conductor (16) is used to deplete a portion of the base width (23) of the bipolar transistor (10).</p>
申请公布号 EP0805497(B1) 申请公布日期 2005.01.26
申请号 EP19970106234 申请日期 1997.04.16
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 TSOI, HAK YAM
分类号 H01L29/73;H01L21/331;H01L21/8222;H01L21/8248;H01L21/8249;H01L27/06;H01L29/06;H01L29/40;H01L29/732;H01L29/735;H01L29/78;(IPC1-7):H01L29/735 主分类号 H01L29/73
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