POLY(VINYL ALCOHOL)-BASED PHOTOSENSITIVE RESIN COMPOSITION IMPROVED IN ANTI-ETCHING PROPERTY AND SENSITIVITY TO EXPOSURE AND REDUCED IN STRIPPING ERROR OF RESIN AFTER ETCHING

摘要

PURPOSE: A poly(vinyl alcohol)-based anti-etching photosensitive resin composition is provided, to allow a pattern to be exposed with a small amount of exposure light, to prevent a pattern from being deviated the position, to suppress the corrosion of a metal plate and to improve stripping property. CONSTITUTION: The poly(vinyl alcohol)-based anti-etching photosensitive resin composition comprises a poly(vinyl alcohol)-based resin having a degree of saponification of 65-98 mol% and a 4 wt% aqueous solution viscosity of 4-46 mPa·s at 20 deg.C; a carboxyl group-containing water-soluble polymer having 4 wt% aqueous solution viscosity less than 20,000 mPa·s at 20 deg.C; and an alkali dichromate photosensitivity imparting agent. Preferably the poly(vinyl alcohol)-based resin is a mixture of (a) a partially saponified poly(vinyl alcohol) having a degree of saponification of 80-95 mol% and 4 wt% aqueous solution viscosity of 4-8 mPa·s at 20 deg.C and (b) a partially saponified poly(vinyl alcohol) having a degree of saponification of 80-95 mol% and a 4 wt% aqueous solution viscosity of 9-80 mPa·s at 20 deg.C, the difference of 4 wt% aqueous solution viscosity at 20 deg.C is 5 mPa·s or more, and the ratio is 10:90 to 50:50 by weight. Preferably the alkali dichromate is ammonium dichromate.