发明名称 |
POLYMER COMPOSITION COMPRISING ORGANIC MATERIAL-MODIFIED PHILOSILICATE, FILM, GAS BARRIER FILM AND SUBSTRATE AND IMAGE DISPLAY ELEMENT USING THOSE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer composition having both of the excellent heat resistance and the excellent gas barrier property and a film composed of the polymer composition and to provide a gas barrier film having the film and to provide a substrate and an image display element having excellent fineness and durability. <P>SOLUTION: The present invention provides the polymer comprising an organic material-modified philosilicate having 190-350°C decomposition-starting temperature in a polymer having 120-400°C glass transition temperature of the polymer alone, the film composed of the polymer composition, the gas barrier film having an organic-inorganic hybrid layer and obtained by a sol-gel method, a substrate having the film or the gas barrier film and the image display element having at least anode, a luminescent organic thin film layer and a cathode on the film or the bas barrier film. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004107541(A) |
申请公布日期 |
2004.04.08 |
申请号 |
JP20020274037 |
申请日期 |
2002.09.19 |
申请人 |
FUJI PHOTO FILM CO LTD |
发明人 |
NARUSE HIDEAKI;NISHIMI TAISEI |
分类号 |
C08J7/04;C08J5/18;C08K9/04;C08L101/12;H01L51/52;H05B33/04 |
主分类号 |
C08J7/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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