| 摘要 |
PROBLEM TO BE SOLVED: To prevent a substrate as a work from rising up due to the suction created by a processing liquid suction means so as to enable the substrate to make a uniform liquid treatment. SOLUTION: The liquid processing apparatus is equipped with a spin chuck 10 holding a glass substrate G; a nozzle head 20 provided with a liquid processing plane 21 which is capable of moving relatively parallel with the surface of the substrate G as keeping separate from the substrate G by a certain gap; a developing solution supply nozzle 22 supplies a developing solution so as to form the belt-like flow of developing solution on the surface of the glass substrate G; suction nozzles 23 which are provided on the liquid processing plane 21 arranged in parallel with the developing solution supply nozzle 22, suck up the developing solution supplied from the developing solution supply nozzle 22, and form the flow of developing solution on the surface of the glass substrate G; and a sucking/holding member 18 which is provided to the spin chuck 10, and prevents the glass board G from rising up due to the suction created by the suction nozzles 23 holding the rear surface of the substrate G by suction. The sucking/holding member 18 is connected to a developing solution sucking conduit 76 connecting the suction nozzles 23 to an ejector 77. COPYRIGHT: (C)2004,JPO |
