| 发明名称 |
DUAL CHAMBER VACUUM PROCESSING SYSTEM |
| 摘要 |
<p>A photoresist ashing system includes two processing chambers configured for alternate operation in processing substrates. The system includes a single pump that performs both pump-down and process pumping of both of the chambers. In operation, one of the chambers is pumped down and processed while the other chamber is vented, unloaded and re-loaded.</p> |
| 申请公布号 |
WO2004010482(A1) |
申请公布日期 |
2004.01.29 |
| 申请号 |
WO2003US22676 |
申请日期 |
2003.07.21 |
| 申请人 |
AXCELIS TECHNOLOGIES, INC. |
发明人 |
WANG, ALBERT |
| 分类号 |
H01L21/3065;H01L21/00;(IPC1-7):H01L21/00 |
主分类号 |
H01L21/3065 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
