METHOD AND APPARATUS FOR CLEANING CYLINDRICAL BASE MATERIAL, AND METHOD FOR MANUFACTURING CYLINDRICAL BASE MATERIAL AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus for cleaning a cylindrical base material, by which foreign matter can be prevented satisfactorily from being stuck again to the cylindrical base material when the cylindrical base material is pulled up and to provide a method for manufacturing the cylindrical base material and an electrophotographic photoreceptor. SOLUTION: This method for cleaning the cylindrical base material A comprises a step to clean the base material A by immersing it in a cleaning liquid while overflowing the cleaning liquid from a cleaning tank 2 and a step to pull up the cleaned base material A from the cleaning liquid. When the cleaning liquid is overflowed, the cleaning liquid is supplied from a cleaning liquid supplying port 5 along the liquid level, so that the flow velocity of the suspended matter on the liquid level can be accelerated sufficiently and the suspended matter can be discharged efficiently from the tank 2. When the cleaned base material A is pulled up from the cleaning liquid, the foreign matter can be brushed off easily by the cleaning liquid supplied from the port 5 along the liquid level even when the foreign matter is stuck to the base material A. COPYRIGHT: (C)2004,JPO