发明名称 METHOD FOR DEPOSITING TI-SI-N BASED RIGID COATING FILM
摘要 PURPOSE: A method for three-dimensionally depositing Ti-Si-N based rigid coating film on mold, high speed steel tool or hard metal tool through hybrid process of arc ion plating and sputtering is provided. CONSTITUTION: In a method for depositing a Ti-Si-N based rigid coating film on the surface of mold and tool through arc ion plating and sputtering, the method for depositing the Ti-Si-N based rigid coating film comprises first step (S12,S13) of evacuating a chamber in which the mold and tool are installed, and heating the chamber; second step (S14) of cleaning the mold and tool by flowing Ar gas into the chamber and impressing bias to the Ar gas; third step (S15) of blocking inflow of Ar gas into the chamber, applying vacuum into the chamber and heating the chamber again; fourth step (S16) of flowing Ar gas and N2 gas into the chamber and impressing bias to the Ar gas and N2 gas; and fifth step (S17) of depositing a Ti-Si-N based rigid coating film on the surface of the mold and tool by impressing power supply to Ti target using the arc ion plating and Si target using the sputtering respectively.
申请公布号 KR20030073623(A) 申请公布日期 2003.09.19
申请号 KR20020013274 申请日期 2002.03.12
申请人 KIM, KWANG HO 发明人 CHOI, SEONG RYONG;KIM, KWANG HO;YOON, SUN YEONG
分类号 C23C14/22;(IPC1-7):C23C14/22 主分类号 C23C14/22
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