| 摘要 |
PROBLEM TO BE SOLVED: To provide a film thickness measuring method using optical interference, in which a high-precision measurement is possible with a single measuring instrument even if a measurement range for an object is wide. SOLUTION: The film thickness of an object, which is to be measured, is acquired from an interference waveform which is acquired by spectroscopy, for each wavelength, of reflection light or transmission light from the object which is irradiated with light. The number of acquired extreme values of interference waveform or amplitude of the interference waveform is compared to a preset reference value, and depending on the result, one film-thickness calculation method is selected from among a plurality of different film-thickness calculation methods, for film thickness calculation. COPYRIGHT: (C)2003,JPO
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