发明名称 Methods of making microelectronic assemblies including compliant interfaces
摘要 A method of making a microelectronic assembly including a compliant interface includes providing a first support structure, such as a flexible dielectric sheet, having a first surface and a porous resilient layer on the first surface of the first support structure, stretching the first support structure and bonding the stretched first support structure to a ring structure. The first surface of a second support structure, such as a semiconductor wafer, is then abutted against the porous layer and, desirably after the abutting step, a first curable liquid is disposed between the first and second support structures and within the porous layer. The first curable liquid may then be at least partially cured.
申请公布号 US6525429(B1) 申请公布日期 2003.02.25
申请号 US20000517852 申请日期 2000.03.02
申请人 TESSERA, INC. 发明人 KOVAC ZLATA;MITCHELL CRAIG;DISTEFANO THOMAS;SMITH JOHN
分类号 H01L23/12;H01L21/56;H01L21/60;H01L23/28;H01L23/48;H01L23/498;H05K1/11;H05K3/36;H05K3/40;(IPC1-7):H01L23/48 主分类号 H01L23/12
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