发明名称 Use of membrane properties to reduce residual stress in an interlayer region
摘要 A method and apparatus comprising thinning a substrate sufficiently to allow it to be mechanically compliant with a material deposited on its surface is disclosed. The mechanical compliance allows a reduction in the interlayer stress generated by dissimilarities in the materials.
申请公布号 US2003021971(A1) 申请公布日期 2003.01.30
申请号 US20020238081 申请日期 2002.09.10
申请人 ZHENG DAWAI 发明人 ZHENG DAWAI
分类号 C23C14/00;C23C14/58;H01L21/20;H01L21/285;(IPC1-7):B32B7/02 主分类号 C23C14/00
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