SPUTTERING TARGET, MANUFACTURING METHOD THEREFOR, AND METHOD FOR MANUFACTURING ALLOY FILM AND PROBE PIN

摘要

PROBLEM TO BE SOLVED: To form an alloy film with uniform composition. SOLUTION: This sputtering target 10 has a sputtering target plate 12, a first sputtering member 14 which is composed of a first material and is arranged on the sputtering target plate 12, and a second sputtering member 16 which is composed of a second material and is arranged on a different position of the sputtering target plate 12 from the one on which the first sputtering member 14 is arranged. The method for manufacturing the alloy film including the first material and the second material, comprises a step of rotating the sputtering target 10, and a step of sputtering while rotating the sputtering target 10.