发明名称 |
APPARATUS AND METHOD FOR THE IN-SITU GENERATION OF DOPANTS |
摘要 |
A method and apparatus for generating a dopant gas species which is a reaction product of a metal and a gas reactive therewith to form the dopant gas species. A source mass of metal is provided and contacted with the reactive gas to yield a dopant gas species. The dopant gas species may be passed to a chemical vapor deposition reactor, or flowed to an ionization chamber to generate ionic species for ion implantation. |
申请公布号 |
EP1027482(A4) |
申请公布日期 |
2002.12.18 |
申请号 |
EP19980939246 |
申请日期 |
1998.08.05 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS, INC. |
发明人 |
BHANDARI, GAUTAM;OLANDER, W. KARL;TODD, MICHAEL, A.;GLASSMAN, TIMOTHY E. |
分类号 |
H01J27/02;C23C16/448;C30B25/14;C30B31/16;H01L21/205;H01L21/265;H01L21/383 |
主分类号 |
H01J27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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