Apparatus and method for rotating drum chemical bath deposition

摘要

The present invention relates to a novel method and apparatus for chemical bath deposition or other plating or similar processes. The deposition may be performed in a rotating drum that has been provided with a mechanism for temperature elevation. A substrate or other suitable recipient bed upon which deposition is sought may be removably attached to the interior of the drum. Reactants or other materials may be added to the drum to deposit a film, layer, or uniform particles on the surface of the substrate.