发明名称 |
SUBSTRATE FOR X-RAY MASK, ITS MANUFACTURING METHOD, X- RAY MASK AND ITS MANUFACTURING METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide an X-ray mask which has high position precision after the mask is formed and can maintain the high position precision while the mask is used. SOLUTION: In an X-ray mask 1, an X-ray transmission film 12 has specified tensile stress as a whole and has film stress lower than specified at a specified region of a surface layer of the X-ray transmission film 12. The X-ray transmission film 12 is composed of the same crystalline material as a whole, and has practically uniform stress in the specified region of the surface layer without stress change in the film thickness direction.</p> |
申请公布号 |
JP2001230194(A) |
申请公布日期 |
2001.08.24 |
申请号 |
JP20000042395 |
申请日期 |
2000.02.21 |
申请人 |
HOYA CORP;MITSUBISHI ELECTRIC CORP |
发明人 |
SHIYOUKI TSUTOMU;KAWAHARA TAKAMITSU;YABE HIDETAKA;KITAMURA KAEKO |
分类号 |
H01L21/027;G03F1/22;(IPC1-7):H01L21/027;G03F1/16 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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