发明名称 SUBSTRATE FOR X-RAY MASK, ITS MANUFACTURING METHOD, X- RAY MASK AND ITS MANUFACTURING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray mask which has high position precision after the mask is formed and can maintain the high position precision while the mask is used. SOLUTION: In an X-ray mask 1, an X-ray transmission film 12 has specified tensile stress as a whole and has film stress lower than specified at a specified region of a surface layer of the X-ray transmission film 12. The X-ray transmission film 12 is composed of the same crystalline material as a whole, and has practically uniform stress in the specified region of the surface layer without stress change in the film thickness direction.</p>
申请公布号 JP2001230194(A) 申请公布日期 2001.08.24
申请号 JP20000042395 申请日期 2000.02.21
申请人 HOYA CORP;MITSUBISHI ELECTRIC CORP 发明人 SHIYOUKI TSUTOMU;KAWAHARA TAKAMITSU;YABE HIDETAKA;KITAMURA KAEKO
分类号 H01L21/027;G03F1/22;(IPC1-7):H01L21/027;G03F1/16 主分类号 H01L21/027
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