发明名称 |
POLISING BOARD HAVING LIQUID SUPPLY MECHANISM |
摘要 |
PROBLEM TO BE SOLVED: To facilitate attachment/detachment of a work and replacing and cleaning of polishing cloth by blowing out a slurry and a rinse liquid to an upper surface from an under surface of the polishing cloth through a polishing plate by a liquid supply system arranged on a polishing table. SOLUTION: A large number of cloth water passing small holes 1a are arranged in polishing cloth 1. A large number of plate water passing small holes 2a for communicating with a large number of cloth water passing small holes 1a are bored in polishing plate 2. A liquid storage clearance part 3 for communicating with a lower part of the plate water passing small holes 2a is arranged between the polishing plate 2 and a polishing table 4. A slurry and rinse liquid supply system 5 is arranged on the polishing table 4, and respective liquids are blown out to an upper surface of the polishing cloth 1 when necessary, thereby easily perform work such as attachment of a work and repapering and cleaning of the polishing cloth 1 by eliminating a nozzle in the vicinity of the polishing cloth 1. |
申请公布号 |
JP2001038605(A) |
申请公布日期 |
2001.02.13 |
申请号 |
JP19990220637 |
申请日期 |
1999.08.04 |
申请人 |
LAPMASTER SFT CORP |
发明人 |
HATANO KOICHI;MATSUMOTO YASUO;KISHIDA FUMIKI |
分类号 |
B24B37/00;B24B37/015;H01L21/304 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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