发明名称 SUBSTRATE DETACHING CONTROL METHOD OF VACUUM TREATER AND VACUUM TREATER
摘要 <p>PROBLEM TO BE SOLVED: To provide a substrate detaching control method which can make a substrate to be treated, which is electrostatically chucked on a substrate holding stand, peeled from the substrate holding stand stably and smoothly without inflicting damage on the substrate or without making the substrate break, and a vacuum treater, which is provided with a constitution suitable to the detaching control method and also is specially raised in functional properties, reliability and the like. SOLUTION: This vacuum treater transfers the rotary power of a drive source 63 to the wheel 62b on one side of one pair of wheels 62a and 62b of a magnetic coupling 62, which are magnetically adsorbed to each other, and converts the rotary power of the other wheel 62a, which is rotated by the magnetic adsorptivity of the wheel 62a to the wheel 62b on one side, into a thrusting-up force for thrusting up a substrate 4 to be treated from the rear of the substrate 4. The wheel 62b on one side is rotated by the source 63 at a prescribed angle of rotation so that both wheels 62a and 62b may thrust up the substrate 4 by a thrusting-up force to respond to the angles of rotation, which are shifted from each other.</p>
申请公布号 JP2000349139(A) 申请公布日期 2000.12.15
申请号 JP19990156300 申请日期 1999.06.03
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HARAGUCHI HIDEO;MATSUDA IZURU
分类号 H01L21/683;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/683
代理机构 代理人
主权项
地址