MICROFABRICATED TEMPLATE FOR MULTIPLE CHARGED PARTICLE BEAM CALIBRATIONS AND SHIELDED CHARGED PARTICLE BEAM LITHOGRAPHY

摘要

A method, an associated structure, and an apparatus for multiple charged particle beam calibration and shielded charged particle lithography. A template defining an array of membranes is positioned above a target (e.g., a semiconductor wafer of the electron beams). Each membrane defines a through slot (opening) and a set of registration marks which are located with respec t to registration marks of the other membranes. Patterns are written onto the target by scanning each electron beam through its associated through slot. Intra- and inter-charged particle beam calibrations for each charged particl e beam are carried out using its associated set of registration marks. The template also suppresses undesirable electrical charging of any resist prese nt on the target during the exposure process.