发明名称 METHOD FOR COMPENSATING DOSE AMOUNT USING VARIATION OF SCAN LINE WIDTH AND APPARATUS FOR DOING THE SAME
摘要 PURPOSE: A method for compensating dose amount using variation of scan line width and an apparatus for doing the same are provided to control the line width due to scan directions. CONSTITUTION: A method for compensating dose amount using variation of scan line width includes an illumination light source(56), a reticle terminal(60), a projection plate(64), a substrate terminal(64), a terminal control(68), and a dose amount control(70). The illumination light source(56) provides electromagnetic radiation. The reticle terminal(60) is provided to receive the electromagnetic radiation from the illumination light source(56). The projection plate(64) receives the electromagnetic radiation from the reticle. The substrate terminal(64) receives the electromagnetic radiation from the projection plate. The terminal control(68) is connected to the reticle terminal as well as to the substrate terminal, provides the illumination exposure and controls the translation between the reticle and the substrate terminal. The dose amount control(70) is a function of the position based on the scanning direction and varies the exposure dose amount.
申请公布号 KR20000057743(A) 申请公布日期 2000.09.25
申请号 KR20000001281 申请日期 2000.01.12
申请人 SVG LITHOGRAPHY SYSTEMS INC. 发明人 ENDRU W. MCKLAU
分类号 H01L21/027;G03F7/20;G03F7/22;(IPC1-7):H01L21/027 主分类号 H01L21/027
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