Method to control manufacturing processes of fine structure surfaces in semiconductor manufacturing; involves comparing signatures obtained from diffraction image with references for reference surfaces

摘要

The method involves providing reference signatures of fine structure surfaces. At least one signature of a sample surface to be controlled is measured and compared with the reference signatures, and is classified by parameters according to the comparison result. The reference signatures are measured by measuring the spatial or intensity distribution of a diffraction images of qualitative specific production prototypes. An independent claim is included for a device for implementing the method.