发明名称 Thin film transistor and method for fabricating same
摘要 A method for fabricating a thin film transistor having a substrate includes the steps of forming a gate electrode on the substrate and forming a gate insulating layer on the gate electrode and the substrate. Source and drain electrodes are formed having side surfaces facing each other on the gate insulating layer. An active layer is formed over the source and drain electrodes and the gate insulating layer. A silicide layer is formed on at least one of the side surfaces of the source and drain electrodes.
申请公布号 US6057181(A) 申请公布日期 2000.05.02
申请号 US19990225828 申请日期 1999.01.06
申请人 LG ELECTRONICS INC. 发明人 KIM, WOONG-KWON
分类号 H01L29/786;H01L21/336;H01L29/417;H01L29/45;(IPC1-7):H01L21/336 主分类号 H01L29/786
代理机构 代理人
主权项
地址