| 摘要 |
PROBLEM TO BE SOLVED: To obtain a processing apparatus for substrate surface which can prevent drops of a used processing solution from floating and re-depositing on the surface of a substrate and can facilitate replacement, discharge, etc., of the processing solution at a contact part with a support member to realize uniform and good surface treatment without recontamination, etc. SOLUTION: This apparatus for processing a surface of a substrate at least includes a support member 4 for horizontally carrying a substrate 3, a rotary member 1 for rotating the support 4 having the substrate 3 carried thereon, a rotary drive mechanism 5 for rotating the rotary member 1, jetting 6a, 6b means for jetting a processing solution onto a surface of the substrate, a means 17 for supplying gas into a processing chamber, and evacuating means 22. At this time, the support 4 is provided on the upper end surface of the rotary member 1 of a cylindrical or truncated-cone shape.
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