P-TYPE DIFFUSION SOURCE AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING IT,申请号JP19970354317-传众专利搜索

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发明名称	P-TYPE DIFFUSION SOURCE AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING IT
摘要
申请公布号	JPH11186182(A)	申请公布日期	1999.07.09
申请号	JP19970354317	申请日期	1997.12.24
申请人	TOSHIBA CORP	发明人	KURAMOCHI SHINICHI
分类号	H01L21/225;(IPC1-7):H01L21/225	主分类号	H01L21/225
代理机构		代理人
主权项
地址

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