发明名称 METHOD FOR MANUFACTURING OF PIN HOLES ON SURFACE
摘要 FIELD: microelectronics, in particular, generation of pin holes for manufacturing vacuum integral circuits. SUBSTANCE: method involves oxidation and etching by means of application of gas discharge in crossed electric and magnetic fields with magnetic inductance level in range of 0.005-0.07 T in pure oxygen under pressure in range of 1-0.05 Pa. Simultaneously method involves monitoring of process in order to prevent surface burning. EFFECT: improved emission characteristics, simplified design of manufacturing process. 4 cl, 3 dwg
申请公布号 RU2121193(C1) 申请公布日期 1998.10.27
申请号 RU19960100789 申请日期 1996.01.11
申请人 IKI PRI SARATOVSKOM GOSUDARSTVENNOM UNIVERSITETE I;KOLOSOV VJACHESLAV VIKTOROVICH;GAVRILOV MIKHAIL VIKTOROVICH;SARATOVSKAJA GOSUDARSTVENNAJA AKADEMIJA PRAVA;GAVRILOV MIKHAIL VIKTOROVICH;SARATOVSKAJA G AKADEMIJA PRAVA 发明人 KOLOSOV V.V.;GAVRILOV M.V.
分类号 H01J9/02;H01J1/30;H01J19/24;(IPC1-7):H01J1/30 主分类号 H01J9/02
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