| 摘要 |
<p>PROBLEM TO BE SOLVED: To analyze impurities (substance to be measured) in a liquid sample with high sensitivity, by coating a surface of an analysis substrate with a material not having a peak of characteristic X rays in the vicinity of a peak of characteristic X rays of the substance to be measured. SOLUTION: A surface of a substrate for a total reflection X ray fluorescence analysis is covered with a specific material. The specific material does not have a peak energy of characteristic X rays in a range of E±R when the E is a peak energy of characteristic X rays of a substance to be measured in a liquid sample and R is an energy resolution of an X-ray detection apparatus used for the analysis. After the liquid sample is dropped onto the analysis substrate, the sample is dried and a site left after the sample is dried and evaporated is analyzed in a total reflection X ray fluorescence analysis. The substance in the liquid sample is thus analyzed. For instance, when silicon in the liquid sample is to be analyzed, since silicon Kαrays have an energy of 1.74KeV, a silicon wafer or the like to which gold or platinum not showing a peak of characteristic X rays in the neighborhood is vapor deposited is used as the analysis substrate.</p> |
