| 摘要 |
PROBLEM TO BE SOLVED: To provide a process for producing a spot size converter capable of necessitating respectively and time of a film forming process for a core layer and a mask forming stage for patterning the core layer and forming this mask on a plane. SOLUTION: A difference in level is formed on the surface of a silicon substrate 11 and a lower layer clad 12 is formed thereon. A core 13 thicker than the height of the difference in level is formed on this lower layer clad and the upper part of the core is polished to flatten the surface thereof. As a result, the thickness of the core changes along the propagation direction of light. Next, a resist mask is formed on the surface of the flat core and the core is etched to form a core ridge. As a result, the width of the core changes along the propagation direction of the light. Finally, an upper layer clad 14 is formed and the core ridge is buried. |
