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发明名称
Strahlungsempfindliches Gemisch und Verfahren zur Herstellung von Reliefstrukturen
摘要
申请公布号
DE59010245(D1)
申请公布日期
1996.05.02
申请号
DE19905010245
申请日期
1990.12.18
申请人
BASF AG, 67063 LUDWIGSHAFEN, DE
发明人
SON, NGUYEN KIM, DR., D-6944 HEMSBACH, DE
分类号
G03F7/038;(IPC1-7):G03F7/038
主分类号
G03F7/038
代理机构
代理人
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地址
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