| 摘要 |
This invention provides a method and apparatus for treating solid surfaces to remove unwanted substances, such as oxide, without causing damage to the surfaces; a method and apparatus for forming passivation film having excellent corrosion resistance, adhesion, degasing properties; and a process apparatus capable of forming a high clean atmosphere. The apparatus for surface treatment comprises active hydrogen species generation means, a sample chamber (or a sample itself), means for supplying the generation means with inert gas containing hydrogen gas, means for introducing the active hydrogen species into the sample chamber (or the sample itself), and means for exhausting the sample chamber (or the sample itself). The sample surface is irradiated with active hydrogen species to remove unwanted substances from the sample surface. The sample chamber is connected with means for feeding gas for forming passivation film on the sample surface from which unwanted substances have just been removed.
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