ANTIREFLECTION FILM AND PRODUCTION THEREOF

摘要

PURPOSE:To provide an antireflection film and production method thereof so that the antireflection film can be formed in simple production process without requiring several times of vapor deposition, that the antireflection film formed by oblique vapor deposition has enough film strength, does not cause peeling or cracks, and that the outermost surface layer of the film has a low refractive index. CONSTITUTION:A hard coating layer 13 essentially comprising a resin is formed on a transparent resin base material 12. SiO2 or MgF2 having smaller refractive index than that of the hard coating layer 13 is formed by oblique vapor deposition to form a single-layer oblique vapor deposition layer 14 on the hard coating layer 13 to constitute the antireflection film 21. The hard coating layer 13 to be subjected to vapor deposition is maintained in a half-hardened state and vapor deposition is performed in this state. Then, the layer is completely cured to obtain enough adhesion property of the vapor deposition film.