METHOD AND DEVICE FOR POSITIONING SEMICONDUCTOR INTEGRATED CIRCUIT PATTERN

摘要

PURPOSE:To provide a technique through which a position of a pattern formed on a semiconductor wafer can be accurately measured. CONSTITUTION:When an image signal of a pattern formed on a semiconductor wafer 1 is processed to measure the position of the pattern, an evaluation function by a symmetrical matching method and an evaluation function by a template matching method are obtained respectively as an evaluation function which indicates the likelihood of the center of the pattern, these evaluation functions are added together to obtain a composite evaluation function, and the extremal value of the composite evaluation function is detected.