| 摘要 |
PURPOSE:To obtain an electrodeposition coating bath having good electrodeposition property by using a negative electrodeposition coating resin compsn. containing a specified component, and to obtain a resist pattern of high resolution without incomplete development by using this bath. CONSTITUTION:This electrodeposition coating resin compsn. consists of polymers, non-water soluble monomers having two or more photopolymerizable unsatd. bonds in the molecule, non-water soluble photopolymn. initiator, and compd. expressed by formula and/or salt of this compd. with a basic compd. These polymers are prepared by neutralizing polymers having 20-300 acid value obtd. by copolymn. of acrylic acids and/or methacrylic acids with a basic org. compd. In the formula, Y is a carboxyl group or sulfonic acid group, R1, R2 and R3 are hydrogen atoms, halogen atoms, hydroxyl groups, alkyl groups, phenyl groups, etc., and n is an integer of 1-3. An electrodeposition coating film is formed on a conductive base body in an electrodeposition coating bath which uses this resin compsn. The coating film is then exposed and developed to obtain a resist pattern. |
