METHOD FOR PREPARING A SUBSTRATE FOR SEMICONDUCTOR DEVICES,申请号US19910672979-传众专利搜索

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发明名称	METHOD FOR PREPARING A SUBSTRATE FOR SEMICONDUCTOR DEVICES
摘要
申请公布号	US5152857(A)	申请公布日期	1992.10.06
申请号	US19910672979	申请日期	1991.03.21
申请人	SHIN-ETSU HANDOTAI CO., LTD.	发明人	ITO, TATSUO;UCHIYAMA, ATSUO;FUKAMI, MASAO
分类号	H01L21/02;H01L21/20;H01L21/304;H01L21/762;H01L27/12	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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