| 摘要 |
1,225,180. 225,180. Sputtering platinum &c. GENERAL ELECTRIC CO. July 19, 1968 [Aug.21, 1967], No.34604/68. Heading C7F. [Also in Division H1] A gas electrode is formed by sputtering an electrocatalytic material e.g. Pt optionally with Rh, Ir, Ru or W on to a particulate substrate e.g. boron carbide, tungsten oxide, graphite, etched titanium oxide or an ion-exchange membrane comprising sulphonated poly (trifluorostyrene) or a mixture of a fluorocarbon polymer and a sulphonated copolymer of styrene and divinyl benzene. The electrocatalytic material is suspended from support 108 and the substrate contained in Al dish 118. Base 100 is conductive as is stand 112, Fig.1. In Fig.4 base 212 is insulating; 208 is an anode and 204 a heating element. After initial sputtering the particles may be reorientated by vibration. The product may be applied to a woven screen and covered by sputtering with an additional layer of electrocatalytic material. |
