FORMATION OF SILICON DIOXIDE THIN FILM,申请号JP19870280346-传众专利搜索

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发明名称	FORMATION OF SILICON DIOXIDE THIN FILM
摘要
申请公布号	JPH01123061(A)	申请公布日期	1989.05.16
申请号	JP19870280346	申请日期	1987.11.06
申请人	RICOH CO LTD	发明人	OTA WASABURO;NAKAZAWA MASASHI;ONODERA YUJI
分类号	C23C14/08;C23C14/10;C23C14/32	主分类号	C23C14/08
代理机构		代理人
主权项
地址

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