发明名称 |
Sputter module for modular wafer processing machine. |
摘要 |
<p>A sputter coating module for a multifunction processing machine is provided in which the supporting mechanism for the workpiece can be isolated from the sputtering source, the pumps and other processing apparatus for cleaning without exposing the entire machine to atmosphere. The supporting mechanism which is rotatable from the horizontal to the vertical is hollow and mounted on hollow vacuum-sealed trunnions to allow passage of water, argon, and dry-nitrogen or air at atmospheric pressure into the interior of the supporting mechanism.</p> |
申请公布号 |
EP0308275(A2) |
申请公布日期 |
1989.03.22 |
申请号 |
EP19880308668 |
申请日期 |
1988.09.19 |
申请人 |
VARIAN ASSOCIATES, INC. |
发明人 |
HUTCHINSON, MARTIN ALBERT |
分类号 |
H01L21/677;C23C14/56;H01L21/203 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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