| 摘要 |
PURPOSE:To obtain a resist compsn. for lithography using X-rays by incorporating Michler's ketone further into the resist compsn. which contains a halogen and can be used for X-ray lithography. CONSTITUTION:The Michler's ketone is further incorporated into the resist compsn. which contains the halogen and can be used for X-ray lithography. The Michler's ketone is incorporated as a spectrum sensitizing agent into this compsn. The Michler's ketone used exhibits high absorptivity at 3,650Angstrom wavelength and has a so-called spectral sensitizing effect to widen the sensitivity wavelength range of the resist compsn. to a UV range and has good efficiency as well. The content of this Michler's ketone is usually preferably <=10wt.%, more preferably <=4wt.%, and most adequately <=2wt.%. The excellent effective sensitivity and the sufficient characteristics as the resist compsn. for lithography are thereby obtd. |
