发明名称 METHOD FOR INSPECTION OF RETICLE MASK AND DEVICE THEREFOR
摘要 PURPOSE:To dispense with the converting operation of the pattern data of the original design as well as to contrive both expedition of inspection and improvement in reliability of the title mask by a method wherein the contraction and expansion of a pattern is performed in an inspection device using the pattern data of original design before performance of correction of a format-converted pattern. CONSTITUTION:On the assumption that 5X5 bit is considered as 1 field, the pattern 92 of 2X2 bit formed in a field 90 is considered as an originaly designed pattern. Using a second shift register, a pattern 94 with which a pattern 92 was shifted by one bit to the right side (X-axis direction) is formed on a memory. Besides, a pattern 96 is formed by performing an OR operation on the patterns 92 and 94 by conducting the logical operation of a pattern. Then, a pattern 98 with which the pattern 96 was shifted by one bit at a time to the lower part (Y-axis direction) using a shift register in the same manner as mentioned above, and besides, a pattern 100 is formed by performing an OR operation on the patterns 96 and 98. As a result, the pattern 100 in which one bit each is expanded from the original pattern 92 to the right side and the lower side is completed on the memory.
申请公布号 JPS63153835(A) 申请公布日期 1988.06.27
申请号 JP19870176642 申请日期 1987.07.14
申请人 FUJITSU LTD 发明人 MATSUI SHOGO;KOBAYASHI KENICHI
分类号 H01L21/66;G01B11/24;G01N21/88;G01N21/93;G01N21/956;G01R31/308;G03F1/00;G03F1/84;G03F7/20;H01L21/027 主分类号 H01L21/66
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