| 摘要 |
<p>PURPOSE:To prevent a wafer from being exposed to foreign matter and a defect on a mask by using a hologram as the mask when the wafer is exposed to a pattern. CONSTITUTION:A rainbow holographic mask 3 is used to expose the wafer coated with a photosensitive agent to the pattern. Light irradiated by a light source 1 passes through a lens 2 and is transmitted through the rainbow holographic mask 3. The light of the light source 1 is incoherent light, so it is divided by wavelength on the rainbow holographic mask 3. This is caused because an angle of diffraction by the wavelength is different. For the purpose, the wafer 5 is arranged matching with the photosensitive are of the applied resist to expose the wafer to a real image formed by the rainbow holographic mask 3.</p> |
