发明名称 MEASUREMENT FOR THICKNESS OF THIN FILM
摘要 PURPOSE:To enable the measurement of the thickness in the process, by penetrating a measuring element into a thin film to determine the thickness from the time until the measuring element reaches a substrate from the start of penetration and the penetration rate. CONSTITUTION:When measuring the thickness of a thin film 2, first, a measuring element 3 with a pointed tip is held vertical to the thin film 2 and moved downward. As the tip of the measuring element 3 abuts on the surface of the thin film 2, the mechanical pressure to be applied to the measuring element 3 increases, signalling the contact of the measuring element 3 with the surface of the thin film 2. Under such a condition, a mechanical pressure is applied to the measuring element 3 to be penetrated into the thin film 2 at a specified rate (v). The pressure applied to the measuring element 3 reduces gradually and becomes almost constant after the tip of the measuring element 3 penetrates the thin film 2. Thus, the thickness of the thin film 2 is obtained by multiplying the time (t) until the tip of the measuring element 3 reaches a substrate 1 and the lowering speed (v) of the measuring element 3.
申请公布号 JPS61290317(A) 申请公布日期 1986.12.20
申请号 JP19850132712 申请日期 1985.06.18
申请人 MITSUBISHI ELECTRIC CORP 发明人 HIRATA KATSUHIRO
分类号 G01B5/06;C23C14/54;G01B21/08;H01L21/66 主分类号 G01B5/06
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