发明名称 INTEGRATED CIRCUIT AND METHOD FOR BIASING AN EPITAXIAL LAYER
摘要 <p>An integrated circuit (30) and method for biasing an impurity region, in particular an epitaxial layer (32), to a level substantially equal to a supply voltage level (Vcc) yet exhibiting a high reverse breakdown voltage to negative transients of the supply voltage (Vcc). The integrated circuit (30) and method is of especial utility in power BIMOS and other applications having the substrate (12) at or near the supply voltage level Vcc.</p>
申请公布号 WO1985004524(A1) 申请公布日期 1985.10.10
申请号 US1985000286 申请日期 1985.02.21
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