SEMICONDUCTOR MANUFACTURING EQUIPMENT

摘要

PURPOSE:To operate the titled equipment continuously while removing any reacted produce adhering to th periphery of quartz glass tube by a method wherein a plasma discharger producing plasma is arranged on the space near the periphery above a rotatable quartz glass tube. CONSTITUTION:A cylindrical quartz glass tube 13 provided with multiple linear lamps utilized as a light source is arranged in a reaction chamber 1 so that a substrate 5 may be irradiated with augmented intensity illumination by means of approaching the light source 12 to the substrate 5 up to an arbitrary distance. Besides, in case of forming a thin film, any reacted product adhering to the surface of quartz glass tube 13 is shifted upward by the rotating tube 13 to be etched by plasma produced by a plasma discharger 14 so that the titled equipment with linear lamps lighted may be operated continuously.