| 摘要 |
<p>PURPOSE:To obtain a color filter having high accuracy, excellent spectral characteristic and large economical value by coating a transparent resin in which a dye material is dispersed on a substrate on which a resist mask is formed and removing the resist mask coated with the transparent resin. CONSTITUTION:A resist is coated on the substrate 1 and is exposed through a photomask having a desired pattern and is then developed, by which a resist resin pattern is obtd. The resist mask 2 is formed on the substrate 1 by the above-mentioned stage. A dye layer 3 is then formed on the substrate 1 by a stage for coating the transparent resin in which the dye material is dispersed onto said substrate. The substrate is thereafter dipped into a soln. which can dissolve only the resist mask without changing the spectral characteristic of the dye layer, by which the resist mask is removed from the substrate. A dye pattern 4 is formed by the above-mentioned stage. The position of the resist mask is shifted according to the pattern and the above-mentioned three stages are repeatedly executed, by which the dye patterns 4, 5, 6 are formed on the substrate.</p> |
