发明名称 NOVEL PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain a photopolymerizalbe composition having a high adhesive property and giving a photoresist by blending a nongaseous unsatd. compound with a photopolymn, initiator and a mixture of compounds selected out of at least two groups of compounds among groups of compounds represented by specified formulae. CONSTITUTION:A photopolymerizable composition is composed of a nongaseous unsatd. compound (a) having at least two carbon-carbon double bonds and capable of forming a polymer in the presence of a photopolymn. initiator, the photopolymn. initiator (b) which can be activated by active light,and a mixture (c) of compounds selected out of at least two groups of compounds among groups of compounds represented by formulae I -III. A thermoplastic org. polymer binder (d) may be added. The compounds represented by formulae I -III include 1- pheny-2-mercaptoimidazoline, thiadiazoles such as 3,5-dimercapto-1,2,4-thiadiazoles, and sulfenamides such as N-cyclohexyl-2-benzothiazylsulfenamide, respectively.
申请公布号 JPS616646(A) 申请公布日期 1986.01.13
申请号 JP19840127895 申请日期 1984.06.21
申请人 ASAHI KASEI KOGYO KK 发明人 KANEKO SHIYUNEI;IKEDA AKIHIKO;AI HIDEO
分类号 G03C1/00;C08F2/00;C08F2/48;C08F2/50;G03F7/004;G03F7/027;G03F7/085 主分类号 G03C1/00
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