DEPOSITING EPITAXIAL LAYER OF SILICON FROM A MIXTURE OF SILANE AND AN INERT GAS,申请号CAD869503-传众专利搜索

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发明名称	DEPOSITING EPITAXIAL LAYER OF SILICON FROM A MIXTURE OF SILANE AND AN INERT GAS
摘要
申请公布号	CA869503(A)	申请公布日期	1971.04.27
申请号	CAD869503	申请日期
申请人	RADIO CORPORATION OF AMERICA	发明人	DAVID RICHMAN;ROBERT H. ARLETT
分类号		主分类号
代理机构		代理人
主权项
地址

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