发明名称 SEMICONDUCTOR DEVICE
摘要 A semiconductor device includes a semiconductor substrate of a first conductivity type and a semiconductor layer of a second conductivity type opposite to the first conductivity type formed on the substrate. In the layer are formed a first semiconductor region of the first conductivity type, having a low impurity concentration and formed deep; and a second semiconductor region in a surface area of the layer including the surface of the first semiconductor region. The second region has an impurity concentration higher than that of the first region and formed shallower than it. A power source voltage terminal is connected to the substrate and supplies a voltage applied thereto to the second region through the substrate and the layer.
申请公布号 DE3162083(D1) 申请公布日期 1984.03.08
申请号 DE19813162083 申请日期 1981.03.27
申请人 TOKYO SHIBAURA DENKI KABUSHIKI KAISHA 发明人 SAITO, SHOZO
分类号 H01L27/02;H01L27/07;(IPC1-7):H01L27/06 主分类号 H01L27/02
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